Surface Characterization of Hydrogenated Cvd Diamond Undergraduate Thesis
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منابع مشابه
Laser Micro-Raman Spectroscopy of CVD Nanocrystalline Diamond Thin Film
Laser micro-Raman spectroscopy is an ideal tool for assessment and characterization of various types of carbon-based materials. Due to its special optical properties (CrN) coated stainless steel substrates. NCD films have been investigated by laser micro-Raman spectroscopy. The fingerprint of diamond based materials is in the spectral region of 1000-1600 cm-1 in the first order of Raman scatter...
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The experimentally observed high surface conductivity of hydrogenated diamond films is explained through ab initio results as well as model calculations based on the tight-binding molecular dynamics method. Our results support the previously reported experimental results indicating that the surface conductivity of the hydrogenated diamond surfaces is due to the surface adsorption of a H(3)O(+) ...
متن کاملDiamond surface modification following thermal etching of Si supported hydrogenated diamond films by DBr
In this work, we study the modification of hydrogenated diamond films deposited on silicon resulting from its exposure to DBr followed by an annealing above 600 K, using high resolution electron energy loss spectroscopy (HREELS). This procedure results in silicon carbide SiC formation within the diamond film, as evidenced by the observation of a loss peak at 117 meV and its first harmonic at 23...
متن کاملDiamond-like carbon: state of the art
Diamond-like carbon films, amorphous hydrogenated or non-hydrogenated forms of carbon, are metastable amorphous materials characterized by attractive mechanical, optical, electrical, chemical and tribological properties. The films can be prepared at low temperatures by different techniques using a large variety of precursors and can be modified by incorporation of different elements such as N, ...
متن کاملUV photoemission efficiency of polycrystalline CVD diamond films
The absolute quantum efficiency of polycrystalline diamond films grown on silicon substrates by chemical vapor deposition (CVD) is reported in the range of 25–200 nm. The efficiency of boron-doped and hydrogen-activated by microwave plasma reflective photocathodes peaked at 37% at 40 nm with the sensitivity cutoff observed at ~190 nm. We confirmed that hydrogen activation is relatively stable i...
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